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Acetone Stripping (2) |
Fine and Rough stripping of resists |
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Anti Stiction Coater |
Anti-stiction coater for silicon stamps
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Aligner - EVG620 6 inch |
Allows cassette to cassette processing on 6 inch substrates with high resolution. |
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Aligner - Electro Vision (EV) |
Mask contact aligner that allows for silicon fusion bonding |
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Aligner - Karl Suss MA6/BA6 |
Mask contact aligner with down to 1µm resolution |
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Developer (3) |
Develop photoresist (including SU-8) pattern after exposure |
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EVG NIL |
EVG NIL |
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Hotplates (2) |
SU-8 and other possibilities |
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Lift-off wet bench |
Acetone wet bench for photoresist lift-off |
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Ovens (5) |
Different possibilities |
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Oven - HDMS |
Evaporate HMDS film on wafer to improve adhesion between substrate and photoresist |
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Plasma Asher (2) |
With O2,N2 and CF4
gas lines, for stripping photoresist or remove photoresist residual |
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Spinner - Karl Suss RC8-THP |
Versatile system for spin coating and baking of different photoresist |
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Spinner - SSE Maximus |
Maximus 804 cluster system allowing cassette-to cassette spinning and/or baking of resists |
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Spinner - SSI Track 1 |
Cassette to cassette spinning and/or baking of resists (usually AZ5214) |
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Spinner - SSE Manual |
SSE manual (Polymer) spin coater |
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Spinner - Speedline |
Speedline manual spinner |
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MVD - Applied Microstructures |
Deposition of molecular films (FDTS) on substrates |